Mass spectrometric measurements of neutral reactant and product densities during Si etching in a high‐density helical resonator Cl2plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.362613
Reference20 articles.
1. Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching
2. Theoretical and Experimental Investigations of Chlorine RF Glow Discharges: I . Theoretical
3. Theoretical and Experimental Investigations of Chlorine RF Glow Discharges: II . Experimental
4. Factors affecting the Cl atom density in a chlorine discharge
5. Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
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