Through-silicon via-induced strain distribution in silicon interposer

Author:

Vianne B.,Richard M.-I.,Escoubas S.,Labat S.,Schülli T.,Chahine G.ORCID,Fiori V.,Thomas O.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference23 articles.

1. P. Ramm , M. Wolf , A. Klumpp , R. Wieland , B. Wunderle , and B. Michel , in Proceedings of the 58th IEEE Electronic Components and Technology Conference (ECTC) ( Lake Buena Vista, FL, 2008), pp. 841–846.

2. P. Ramm , A. Klumpp , J. Weber , N. Lietaer , M. Taklo , W. De Raedt , T. Fritzsch , and P. Couderc , in Proceedings of ESSCIRC ( Seville, Spain, 2010), pp. 9–16.

3. K. Liu , X. Zhang , S.K. Ryu , J. Im , R. Huang , and P. Ho , in Proceedings of the 59th IEEE ECTC ( San Diego, CA, 2009), pp. 630–634.

4. Impact of Near-Surface Thermal Stresses on Interfacial Reliability of Through-Silicon Vias for 3-D Interconnects

5. Analytical solution on interfacial reliability of 3-D through-silicon-via (TSV) containing dielectric liner

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