In-situ etch-depth control better than 5 nm with reflectance anisotropy spectroscopy (RAS) equipment during reactive ion etching (RIE): A technical RAS application
Author:
Affiliation:
1. Integrated Optoelectronics and Microoptics Research Group, Physics Department, Technische Universitaet Kaiserslautern (TUK), PO Box 3049, D-67653 Kaiserslautern, Germany
Funder
Deutsche Forschungsgemeinschaft
Stiftung Rheinland-Pfalz für Innovation
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5099526
Reference20 articles.
1. Above-bandgap optical anisotropies in cubic semiconductors: A visible–near ultraviolet probe of surfaces
2. Application of reflectance difference spectroscopy to molecular‐beam epitaxy growth of GaAs and AlAs
3. Optical reflectance measurements of transients during molecular-beam epitaxial growth on (001) GaAs
4. Kinetic Limits of Monolayer Growth on (001) Gaas by Organometallic Chemical-vapor Deposition
5. Optical characterization of surface electronic and vibrational properties of epitaxial antimony monolayers on III–V (110) surfaces
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Fourier Transform Infrared Reflection Anisotropy Spectroscopy of Semiconductor Crystals and Structures: Development and Application in the Mid-Infrared;Applied Spectroscopy;2023-03-05
2. Terahertz Barcodes Enabled by All‐Silicon Metasurfaces for Process Control and Monitoring Applications;Advanced Materials Technologies;2023-02-03
3. Reflectance anisotropy spectroscopy (RAS) for in-situ identification of roughness morphologies evolving during reactive ion etching (RIE);Applied Surface Science;2023-02
4. Interferometric in-situ III/V semiconductor dry-etch depth-control with ±0.8 nm best accuracy using a quadruple-Vernier-scale measurement;Journal of Vacuum Science & Technology B;2021-09
5. Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS);Micromachines;2021-04-29
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3