Metalorganic chemical vapor deposition of aluminum oxide on Si: Evidence of interface SiO2 formation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1483903
Reference27 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. High-quality aluminum oxide gate dielectrics by ultra-high-vacuum reactive atomic-beam deposition
3. Properties of alumina films prepared by low-pressure metal-organic chemical vapour deposition
4. High-resolution depth profiling in ultrathin Al2O3 films on Si
5. Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
Cited by 78 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Removal of cadmium from phosphate industrial wastewater using pozzolan: characterization, experimental and Monte Carlo/SAA simulations studies;International Journal of Environmental Science and Technology;2024-02-29
2. In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor;Journal of Vacuum Science & Technology A;2023-03-30
3. Surface activated bonding of ALD Al2O3 films;Japanese Journal of Applied Physics;2023-02-27
4. Preparation of fly ash based titanium dioxide composite photocatalysts using spent SCR catalyst carriers;Journal of Environmental Chemical Engineering;2022-06
5. High-performance MoO x /n-Si heterojunction NIR photodetector with aluminum oxide as a tunneling passivation interlayer;Nanotechnology;2021-04-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3