Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.125519
Reference15 articles.
1. Preparation and Properties of Ta2 O 5 Films by LPCVD for ULSI Application
2. Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100)
3. Thermodynamic stability of binary oxides in contact with silicon
4. Thermodynamic considerations in refractory metal‐silicon‐oxygen systems
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