Charging effect simulation model used in simulations of plasma etching of silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4759005
Reference18 articles.
1. Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems
2. Dry etching-based silicon micro-machining for MEMS
3. Charging of pattern features during plasma etching
4. Simulation of Ion Trajectories near Submicron-Patterned Surface Including Effects of Local Charging and Ion Drift Velocity toward Wafer
5. Notching as an example of charging in uniform high density plasmas
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