Optical spectroscopy for sputtering process characterization
Author:
Affiliation:
1. Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons, Belgium
2. Department of Physical Electronics, Masaryk University, Kotlářská 2, CZ-61137 Brno, Czech Republic
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0006586
Reference127 articles.
1. VII. On the electro-chemical polarity of gases
2. Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017
3. Magnetron sputtering – Milestones of 30 years
4. Magnetic Field Effects on an Abnormal Truncated Glow Discharge and Their Relation to Sputtered Thin‐Film Growth
5. Pulsed magnetron sputter technology
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