Electromigration-induced leakage current enhancement and its anisotropy in single crystal TiO 2
Author:
Affiliation:
1. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27606, USA
Funder
National Science Foundation
Air Force Office of Scientific Research
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.5090402
Reference60 articles.
1. Electron Injection into Anodic Tantalum Oxide Assisted by Ionic Interface Polarization
2. Mechanism for bipolar switching in aPt/TiO2/Ptresistive switching cell
3. Oxygen vacancy migration and time-dependent leakage current behavior of Ba0.3Sr0.7TiO3 thin films
4. A compact modeling of TiO2-TiO2–x memristor
5. Field-programmable rectification in rutile TiO2 crystals
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