Oxygen vacancy migration and time-dependent leakage current behavior of Ba0.3Sr0.7TiO3 thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1874313
Reference21 articles.
1. A review of high dielectric materials for DRAM capacitors
2. GaAs MMIC Chip-sets for mobile communication systems with on-chip ferroelectric capacitors
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4. An Important Failure Mechanism in MOCVD (Ba,Sr)TiO3 thin Films: Resistance Degradation
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