Morphological fluctuation and electrical properties of sputtered hydrogenated silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.93580
Reference5 articles.
1. Topology of covalent non-crystalline solids II: Medium-range order in chalcogenide alloys and ASi(Ge)
2. Microstructure of plasma‐deposited a‐Si : H films
3. Microstructure of plasma‐deposited a‐Si : H films
4. Properties of polycrystalline silicon prepared by chemical transport in hydrogen plasma at temperatures between 80 and 400 degrees C
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2. Low‐Temperature Polycrystalline Silicon Deposition by Very High Frequency Sputtering Using Ar and H 2;Journal of The Electrochemical Society;1997-11-01
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