Formation of PtO films by reactive sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1663583
Reference7 articles.
1. Resistivity of cermet films containing oxides of silicon
2. Effect of Oxygen on the Temperature Dependence of Electrical Properties of Reactively Sputtered Tantalum Films
3. Cathode Dark‐Space Measurements and Deposition Rates of Tantalum in a Sputtering System
4. X-ray analysis of tantalum films triode-sputtered in argon-oxygen mixtures
5. Influence of Oxygen on the Adherence of Gold Films to Oxide Substrates
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