Anatomy of the dielectric behavior of methyl-m-toluate glasses during and after vapor deposition

Abstract

Glassy films of methyl-m-toluate have been vapor deposited onto a substrate equipped with interdigitated electrodes, facilitating in situ dielectric relaxation measurements during and after deposition. Samples of 200 nm thickness have been deposited at rates of 0.1 nm/s at a variety of deposition temperatures between 40 K and Tg = 170 K. With increasing depth below the surface, the dielectric loss changes gradually from a value reflecting a mobile surface layer to that of the kinetically stable glass. The thickness of this more mobile layer varies from below 1 to beyond 10 nm as the deposition temperature is increased, and its average fictive temperature is near Tg for all deposition temperatures. Judged by the dielectric loss, the liquid-like portion of the surface layer exceeds a thickness of 1 nm only for deposition temperatures above 0.8Tg, where near-equilibrium glassy states are obtained. After deposition, the dielectric loss of the material positioned about 5–30 nm below the surface decreases for thousands of seconds of annealing time, whereas the bulk of the film remains unchanged.