Growth of SiO2thin film by double‐excitation photoinduced chemical vapor deposition incorporated with microwave excitation of oxygen
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.342067
Reference9 articles.
1. Laser‐induced chemical vapor deposition of SiO2
2. Direct photochemical deposition of SiO2from the Si2H6+O2system
3. Low Temperature Growth of SiO2Thin Film by Double-Excitation Photo-CVD
4. SiO2Thin Film Prepared from Si3H8and O2by Photo-CVD Using Double Excitation
5. Collisional deactivation of O(2 1D2) by the atmospheric gases
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1. Characterization of Charged Traps nearSi–SiO2Interface in Photo-Induced Chemical Vapor DepositedSiO2Film;Japanese Journal of Applied Physics;1996-02-28
2. Photoluminescence of SiO2 films grown by photo-induced chemical vapor deposition;Applied Surface Science;1994-05
3. Rapid photo-deposition of silicon dioxide films using 172 nm VUV light;Electronics Letters;1994-03-31
4. Optical characterizations of photo‐induced chemical vapor deposition produced SiO2films in vacuum ultraviolet, ultraviolet, and visible region;Journal of Applied Physics;1993-11
5. Photoluminescence and Its Excimer Laser Irradiation Effects in SiO2Film Prepared by Photo-Induced Chemical Vapor Deposition;Japanese Journal of Applied Physics;1993-06-30
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