Geometrical aspects of a hollow-cathode planar magnetron
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.873421
Reference16 articles.
1. Collimated magnetron sputter deposition
2. Directional deposition of Cu into semiconductor trench structures using ionized magnetron sputtering
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4. High‐rate magnetron sputtering
5. A new sputtering device of radio-frequency magnetron discharge using a rectangular hollow-shaped electrode
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