Plasma characteristics and target erosion profile of racetrack-shaped RF magnetron plasma with weak rubber magnets for full circular target utilization
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference32 articles.
1. RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges;Novotny;Surf. Coat. Technol.,2013
2. Ion assisted deposition of Zn–Mg coatings by unbalanced magnetron sputtering;Shedden;Surf. Coat. Technol.,1999
3. Photocatalytic visible-light active bismuth tungstate coatings deposited by reactive magnetron sputtering;Ratova;Vacuum,2015
4. Magnetron sputter deposition with high levels of metal ionization;Rossnagel;Appl. Phys. Lett.,1993
5. Ionized magnetron sputter deposition of amorphous carbon nitride thin films;Li;J. Vac. Sci. Technol. A,1995
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