Electron attachment rate constants of HBr, CH3Br, and C2H5Br in N2and Ar
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.340431
Reference27 articles.
1. Electron Attachment to Brominated Aliphatic Hydrocarbons of the Form n‐CNH2N+1Br (N = 1–6, 8, and 10). I. An Electron Swarm Study
2. Electron disappearance in pulse irradiated CH3Cl, C2H5Cl, CH3Br, and C2H5Br
3. Dissociative Thermal Electron Attachment to Some Aliphatic Chloro, Bromo, Iodo Compounds
4. Application of electron cyclotron resonance technique in studies of electron capture processes in the thermal energy range
5. Rate coefficients for the attachment reactions of electrons with c-C7F14, CH3Br, CF3Br, CH2Br2and CH3I determined between 200 and 600K using the FALP technique
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1. Attachment Rates;Gaseous Electronics;2011-12-02
2. Low energy electron attachment by bromoalkanes;International Journal of Mass Spectrometry;2004-04
3. Electron attachment in HBr and HCl;The Journal of Chemical Physics;2001-05-15
4. The wavelength dependence of photoinduced hot electron dissociative attachment to methyl bromide adsorbed on gallium arsenide (110);The Journal of Chemical Physics;1998-11-08
5. THE ROLE OF VAN DER WAALS COMPLEXES IN THE THERMALELECTRON ATTACHMENT PROCESSES IN THE GAS PHASE;Progress in Reaction Kinetics and Mechanism;1998-03-01
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