Effects of rapid thermal annealing on the formation of shallowp+njunction by implanting BF2+ions into thin metal films on Si substrate. I. Thin titanium films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351269
Reference17 articles.
1. Generalized guide for MOSFET miniaturization
2. Refractory metal silicides: Thin-film properties and processing technology
3. Specific contact resistivity of TiSi2to P+and n+junctions
4. Design and characteristics of a lightly doped drain (LDD) device fabricated with self-aligned titanium disilicide
5. Resistivities of Thin Film Transition Metal Silicides
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Boron Halides;Kirk‐Othmer Encyclopedia of Chemical Technology;2003-07-18
2. Fluorine Compounds, Inorganic, Boron Trifluoride;Kirk-Othmer Encyclopedia of Chemical Technology;2000-12-04
3. Formation of Shallow p+n Junctions Using Different Annealing Schemes with Low Thermal Budget;Japanese Journal of Applied Physics;2000-03-01
4. Improvement of Thin Palladium and Platinum Silicide Films On (100) Si Substrates By Incorporating Phosphorus Dopant;MRS Proceedings;2000
5. Formation of shallow n+p junctions by phosphorus implantation into thin polycrystalline-Si films on Si substrates and subsequent cobalt silicidation;Solid-State Electronics;1999-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3