Morphology and chemical state of platinum ions implanted into glassy carbon substrates

Author:

Kimata Tetsuya12ORCID,Kato Sho1,Kobayashi Tomohiro3,Yamamoto Shunya2,Yamaki Tetsuya2ORCID,Terai Takayuki14

Affiliation:

1. Department of Nuclear Engineering and Management, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

2. Takasaki Advanced Radiation Research Institute, National Institutes for Quantum Science and Technology, 1233 Watanuki, Takasaki, Gunma 370-1292, Japan

3. Neutron Beam Technology Team, RIKEN, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan

4. The Institute of Engineering Innovation, The University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656, Japan

Abstract

Glassy carbon substrates were implanted with 100 keV platinum ions. The implanted samples were analyzed using cross-sectional transmission electron microscopy (TEM) and x-ray photoelectron spectroscopy. Ion beam sputtering significantly affected the depth profile during platinum-ion implantation. Cross-sectional TEM revealed that the implanted platinum atoms were in the amorphous state and did not aggregate. Chemical state analysis of the platinum-ion-implanted glassy carbon substrates suggested that lattice defects in the substrates owing to the platinum-ion implantation caused the platinum–carbon interaction with electron transfer from platinum to carbon.

Funder

Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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