Operation-induced degradation mechanisms of 275-nm-band AlGaN-based deep-ultraviolet light-emitting diodes fabricated on a sapphire substrate

Abstract

Degradation mechanisms of 275-nm-band AlxGa1-xN multiple quantum well deep-ultraviolet light-emitting diodes fabricated on a (0001) sapphire substrate were investigated under hard operation conditions with the current of 350 mA and the junction temperature of 105 °C. The optical output power (Po) initially decreased by about 20% within the operating time less than 102 h and then gradually decreased to about 60% by 484 h. For elucidating the causes for the initial and subsequent degradations, complementary electrical, time-resolved photoluminescence (TRPL), and impurity characterizations were carried out making a connection with the energy band profiles. Because the degradation of the wells was less significant than the Po reduction, the initial degradation is attributed essentially to the decrease in carrier injection efficiency (ηinjection), not in internal quantum efficiency of the wells, most likely due to depassivation of initially H-passivated preexisting nonradiative recombination centers (NRCs) in a Mg-doped p-type Al0.85Ga0.15N electron blocking layer. The principal cause for the subsequent Po reduction until 484 h is attributed to further decrease in ηinjection due to the appearance of certain current bypasses in addition to continuous depassivation of the NRCs in p-type AlxGa1-xN layers. According to our database on the species of vacancy-type defects acting as NRCs in GaN and AlN, which have been identified using the combination of positron annihilation and TRPL measurements, vacancy clusters comprised of a cation vacancy (VIII) and nitrogen vacancies (VN), such as VIIIVN2∼4, are the most suspicious origins of the NRCs in Mg-doped p-type AlxGa1-xN layers.