Grazing-incidence small angle x-ray scattering studies of phase separation in hafnium silicate films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1617369
Reference11 articles.
1. Hafnium and zirconium silicates for advanced gate dielectrics
2. Chemical and physical limits on the performance of metal silicate high-k gate dielectrics
3. Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition
4. High temperature stability in lanthanum and zirconia-based gate dielectrics
5. Application of Metastable Phase Diagrams to Silicate Thin Films for Alternative Gate Dielectrics
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