High mobility ultra-thin crystalline indium oxide thin film transistor using atomic layer deposition
Author:
Affiliation:
1. Department of Electro-mechanical Systems Engineering, Korea University, Sejong 339-700, South Korea
2. Reality Device Research Division, Electronics and Telecommunications Research Institute (ETRI), Daejeon 34129, South Korea
Funder
Institute for information & communications technology promotion, Korea
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5041029
Reference33 articles.
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5. ZnO-based transparent thin-film transistors
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