In situ stress evolution during magnetron sputtering of transition metal nitride thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2985814
Reference23 articles.
1. The origins of stress in thin nickel films
2. Aluminum films deposited by rf sputtering
3. Structure and internal stress in ultra-thin silver films deposited on MgF2 and SiO substrates
4. Physical Origins of Intrinsic Stresses in Volmer–Weber Thin Films
5. Origin of Compressive Residual Stress in Polycrystalline Thin Films
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