F-enhanced morphological and thermal stability of NiSi films on BF2+-implanted Si(001)
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1533856
Reference13 articles.
1. Analysis of resistance behavior in Ti- and Ni-salicided polysilicon films
2. Salicidation process using NiSi and its device application
3. Compatibility of NiSi in the self-aligned suicide process for deep submicrometer devices
4. Modeling of agglomeration in polycrystalline thin films: Application to TiSi2on a silicon substrate
5. Effects of Annealing on Thin Gold Films
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