Atomic-scale redistribution of dopants in polycrystalline silicon layers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3466783
Reference27 articles.
1. Experimental study of threshold voltage fluctuation due to statistical variation of channel dopant number in MOSFET's
2. Modeling statistical dopant fluctuations in MOS transistors
3. Suppression of random dopant-induced threshold voltage fluctuations in sub-0.1-μm MOSFET's with epitaxial and δ-doped channels
4. Proceedings of the IEDM Technical Digest;Pouydebasque A.,2005
5. Proceedings of the 15th IEEE International Conference on Advanced Thermal Processing of Semiconductors;Bidaud M.,2007
Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Atom probe tomography of hyper-doped Ge layers synthesized by Sb in-diffusion by pulsed laser melting;Materials Science in Semiconductor Processing;2023-09
2. Grain size effect on interfacial segregation in nanomaterials;Journal of Physics and Chemistry of Solids;2022-05
3. Segregation mechanism of arsenic dopants at grain boundaries in silicon;Science and Technology of Advanced Materials: Methods;2021-01-01
4. Laser-assisted atom probe tomography;Advances in Imaging and Electron Physics;2020
5. Revealing the factors influencing grain boundary segregation of P, As in Si: Insights from first-principles;Acta Materialia;2019-04
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3