High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2005380
Reference26 articles.
1. Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems
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5. Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition
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