Artifact mitigation of ptychography integrated with on-the-fly scanning probe microscopy-Reference-Cited by-同舟云学术

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Artifact mitigation of ptychography integrated with on-the-fly scanning probe microscopy

Published:2017-07-10 Issue:2 Volume:111 Page:023103
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Huang Xiaojing¹^ORCID,Yan Hanfei¹,Ge Mingyuan¹,Öztürk Hande¹,Nazaretski Evgeny¹^ORCID,Robinson Ian K.²³⁴,Chu Yong S.¹

Affiliation:

1. National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, USA

2. Condensed Matter Physics and Materials Department, Brookhaven National Laboratory, Upton New York 11973, USA

3. Research Complex at Harwell, Didcot, Oxfordshire OX11 0DE, United Kingdom

4. London Centre for Nanotechnology, University College London, London WC1H 0AH, United Kingdom

Funder

U.S. Department of Energy (DOE)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.4993744

Reference36 articles.

1. Breaking the 10 nm barrier in hard-X-ray focusing

2. Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics

3. Interlaced zone plate optics for hard X-ray imaging in the 10 nm range

4. 11 nm hard X-ray focus from a large-aperture multilayer Laue lens

5. High numerical aperture multilayer Laue lenses

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4. Soft X-ray spectro-ptychography of boron nitride nanobamboos, carbon nanotubes and permalloy nanorods;Journal of Synchrotron Radiation;2023-05-05

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