Development of texture in TiN films by use ofin situsynchrotron x-ray scattering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1436558
Reference16 articles.
1. Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode
2. Structure and properties of TiN coatings
3. Change of the critical thickness in the preferred orientation of TiN films
4. Plasma-induced and plasma-assisted chemical vapour deposition
5. Analysis of TiC and TiN films prepared by an arc‐induced ion plating
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