Highly oriented ferroelectric CaBi2Nb2O9 thin films deposited on Si(100) by pulsed laser deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.118587
Reference3 articles.
1. Integration of ferroelectric thin films into nonvolatile memories
2. Silicon surface passivation by hydrogen termination: A comparative study of preparation methods
3. Crystal structure of (Sr, Ba)Bi2Ta2O9
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