Silicon epitaxial growth on the Si(001)2×1 surface from silane using dynamic Monte Carlo simulations
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1559151
Reference44 articles.
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5. Low‐Pressure Chemical Vapor Deposition of Polycrystalline Silicon: Analysis of Nonuniform Growth in an Industrial‐Scale Reactor
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