Gate-induced switching of perpendicular exchange bias with very low coercivity in Pt/Co/Ir/Cr2O3/Pt epitaxial film

Author:

Ekawa Hirofumi1,Shen Jiaqi1,Toyoki Kentaro123ORCID,Nakatani Ryoichi123ORCID,Shiratsuchi Yu123ORCID

Affiliation:

1. Department of Materials Science and Engineering, Graduate School of Engineering, Osaka University 1 , Suita, Osaka 565-0871, Japan

2. Spintronics Research Network Division, Institute for Open and Transdisciplinary Research Initiatives, Osaka University 2 , Yamadaoka 2-1, Suita, Osaka 565-0871, Japan

3. Center for Spintronics Research Network, Graduate School of Engineering Science, Osaka University 3 , Machikaneyama 1-3, Toyonaka, Osaka 560-8531, Japan

Abstract

We investigate magnetoelectric switching of perpendicular exchange bias with very low coercivity in a Pt/Co/Ir/Cr2O3/Pt epitaxial film. We also optimize the suitable Ir spacer thickness so that the film exhibits the perpendicular exchange bias greater than the coercivity up to the vicinity of the Néel temperature. Main impact of the Ir spacer layer is the significant reduction of coercivity less than 0.5 mT in maintaining both the perpendicular magnetic anisotropy and the perpendicular exchange bias. For the suitable structure, the perpendicular exchange bias was isothermally switched by the gate voltage in combination with the magnetic field. Analysis of the hysteresis of the exchange bias field as a function of the gate voltage suggested that the magnetoelectric coefficient was comparable to the reported value. This implies that the Ir layer does not degrade the efficiency to transfer the magnetoelectrically controlled antiferromagnetic order parameter to the ferromagnetic Pt/Co/Ir trilayer.

Funder

Japan Society for the Promotion of Science

Iketani Science and Technology Foundation

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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