Mechanisms of radical production in radiofrequency discharges of CF3Cl, CF3Br, and certain other plasma etchants: Spectrum of a transient species
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.327567
Reference29 articles.
1. The effect of added hydrogen on the rf discharge chemistry of CF4, CF3H, and C2F6
2. THE REACTIONS OF PERFLUOROETHYL RADICALS WITH HYDROGEN AND METHANE
3. THE REACTIONS OF PERFLUOROETHYL RADICALS WITH HYDROGEN AND METHANE
4. THE REACTIONS OF PERFLUOROETHYL RADICALS WITH HYDROGEN AND METHANE
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