Measurement of heat capacity and enthalpy of formation of nickel silicide using nanocalorimetry-Reference-Cited by-同舟云学术

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Measurement of heat capacity and enthalpy of formation of nickel silicide using nanocalorimetry

Published:2009-11-02 Issue:18 Volume:95 Page:181911
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Kummamuru Ravi K.,De La Rama Lito,Hu Liang,Vaudin Mark D.,Efremov Mikhail Y.,Green Martin L.,LaVan David A.,Allen Leslie H.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3255009

Reference22 articles.

1. Transient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully silicided gate applications

2. An off-normal fibre-like texture in thin films on single-crystal substrates

3. Silicidation in Ni/Si thin film system investigated by X-ray diffraction and Auger electron spectroscopy

4. Effects of stress on the formation and growth of nickel silicides in Ni thin films on (001)Si

5. Addressing materials and integration issues for NiSi silicide contact metallization in nano-scale CMOS devices

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4. The Effect of Hf Addition on the Boronizing and Siliciding Behavior of CoCrFeNi High Entropy Alloys;Materials;2022-03-19

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