Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node-Reference-Cited by-同舟云学术

Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node

Published:2013-06-03 Issue:22 Volume:102 Page:222107
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Attota Ravikiran,Bunday Benjamin,Vartanian Victor

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4809512

Reference15 articles.

1. M. Ieong, K. W. Guarini, V. Chan, K. Bernstein, R. Joshi, J. Kedzierski, and W. Haensch, in Proceedings of the IEEE Custom Integrated Circuits Conference (2003), pp. 207–213.

2. Three-dimensional integrated circuits

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