Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy-Reference-Cited by-同舟云学术

Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy

Published:2020-09 Issue:5 Volume:38 Page:050602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Rim Min-Ho¹²,Agocs Emil¹,Dixson Ronald¹,Kavuri Prem¹,Vladár András E.¹,Attota Ravi Kiran¹

Affiliation:

1. Microsystems and Nanotechnology Division, PML, NIST, Gaithersburg, Maryland 20899

2. SAMSUNG Electronics Co., Ltd., 1, Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, South Korea

Funder

Samsung

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000352

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