Structural and Electrical Properties of Tantalum Films Sputtered in Oxygen‐Argon Mixtures
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1660653
Reference12 articles.
1. Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films
2. Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical Characteristics
3. The mechanism of reactive sputtering
4. Thin Films Deposited by Bias Sputtering
5. A NEW STRUCTURE IN TANTALUM THIN FILMS
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