Reactive sputtering deposition of low temperature tantalum suboxide thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.109094
Reference26 articles.
1. Promising storage capacitor structures with thin Ta/sub 2/O/sub 5/ film for low-power high-density DRAMs
2. Preparation and Properties of Ta2 O 5 Films by LPCVD for ULSI Application
3. Metal‐oxide‐semiconductor characteristics of chemical vapor deposited Ta2O5films
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