Hydrogen termination of the NH4F‐treated Si(111) surface studied by photoemission and surface infrared spectroscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351541
Reference19 articles.
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3. Formation of SiH bonds on the surface of microcrystalline silicon covered with SiOx by HF treatment
4. Unusually Low Surface-Recombination Velocity on Silicon and Germanium Surfaces
5. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology
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3. Initial stages of porous silicon formation: An in‐situ investigation of the electronic properties and surface morphology;physica status solidi (c);2004-03
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