Growth mechanism of polycrystalline silicon films from hydrogen-diluted SiCl4 at low temperature
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1996828
Reference18 articles.
1. Present and future applications of amorphous silicon and its alloys
2. Improvement of n-Type Poly-Si Film Properties by Solid Phase Crystallization Method
3. Thin-film poly-Si solar cells on glass substrate fabricated at low temperature
4. Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) Method
5. Development of highly conductiven‐type μc‐Si:H films at low power for device applications
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Growth of Silicon Nanosheets Under Diffusion-Limited Aggregation Environments;Nanoscale Research Letters;2015-10-30
2. A high carrier-mobility crystalline silicon film directly grown on polyimide using SiCl4/H2 microwave plasma for flexible thin film transistors;Journal of Materials Chemistry C;2015
3. High rate deposition of nanocrystalline silicon by thermal plasma enhanced CVD;RSC Advances;2013
4. Effect of argon on the structure of hydrogenated nanocrystalline silicon deposited from tetrachlorosilane/hydrogen/argon plasma;physica status solidi (a);2012-03-07
5. Low-temperature (120°C) growth of nanocrystalline silicon films prepared by plasma enhanced chemical vapor deposition from SiCl4/H2 gases: Microstructure characterization;Applied Surface Science;2012-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3