Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge-Reference-Cited by-同舟云学术

Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

Published:2008-04-07 Issue:14 Volume:92 Page:143104
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Balogh Zoltán,Erdélyi Zoltán,Beke Dezső L.,Langer Gábor A.,Csik Attila,Boyen Hans-Gerd,Wiedwald Ulf,Ziemann Paul,Portavoce Alain,Girardeaux Christophe

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2908220

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1. Possible displacement of the climate signal in ancient ice by premelting and anomalous diffusion

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4. Anomalous diffusion of Au in mega-electron-volt Au implanted SiO2∕Si(100)

5. Anomalous diffusion of lightly implanted As into Si substrate during N2annealing

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