Reduction in the localized band‐gap states in amorphous silicon by annealing and hydrogen implantation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94444
Reference15 articles.
1. Dual-gate a—Si:H thin film transistors
2. Amorphous‐silicon charge‐coupled devices
3. Amorphous-silicon image sensor IC
4. Effects of controlled hydrogenation by ion implantation on the localized states in vacuum evaporated amorphous silicon
5. The Effect of HCl and Cl[sub 2] on the Thermal Oxidation of Silicon
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