Chemical bonding and nanomolecular length effects on work function at Au-organophosphonate-HfO2 interfaces-Reference-Cited by-同舟云学术

Chemical bonding and nanomolecular length effects on work function at Au-organophosphonate-HfO2 interfaces

Published:2017-05 Issue:18 Volume:110 Page:181604
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Winter Roy¹,Kwan Matthew²^ORCID,Mutin P. Hubert³,Ramanath Ganpati²,Eizenberg Moshe¹

Affiliation:

1. Department of Materials Engineering, The Technion–Israel Institute of Technology, Haifa 32000, Israel

2. Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA

3. Institut Charles Gerhardt Montpellier, UMR 5253 CNRS-UM-ENSCM, Université Montpellier, CC 1701, Place Eugène Bataillon, 34095 Montpellier Cedex 5, France

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.4981773

Reference34 articles.

1. High dielectric constant gate oxides for metal oxide Si transistors

2. Role of charge transfer, dipole-dipole interactions, and electrostatics in Fermi-level pinning at a molecular heterojunction on a metal surface

3. Tunable Arrays of C60 Molecular Chains

4. Large potential steps at weakly interacting metal-insulator interfaces

5. Boron Nitride on Cu(111): An Electronically Corrugated Monolayer

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