Generation of boron ion beams by vacuum arc and planar magnetron ion sources-Reference-Cited by-同舟云学术

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Generation of boron ion beams by vacuum arc and planar magnetron ion sources

Published:2019-10-01 Issue:10 Volume:90 Page:103302
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Bugaev Alexey¹,Frolova Valeria¹²,Gushenets Vasily¹^ORCID,Nikolaev Alexey¹^ORCID,Oks Efim¹²^ORCID,Savkin Konstantin¹,Shandrikov Maxim¹^ORCID,Vizir Alexey¹^ORCID,Yushkov Anatoly³,Kadlubovich Boris³,Yushkov Georgy¹^ORCID

Affiliation:

1. Institute of High Current Electronics, Siberian Branch of the Russian Academy of Science, Tomsk 634055, Russia

2. Tomsk State University of Control System and Radioelectronics, Tomsk 634050, Russia

3. National Research Tomsk Polytechnic University, Tomsk 634050, Russia

Funder

Russian Science Foundation

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5125704

Reference20 articles.

1. Vacuum arc deposition of thin films from an LaB6 cathode

2. Generation of a boron ion beam in a modified ion source for semiconductor applications

3. Plasma “anti-assistance” and “self-assistance” to high power impulse magnetron sputtering

4. Cathodic arcs: Fractal voltage and cohesive energy rule

5. Self-organization and self-limitation in high power impulse magnetron sputtering

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1. Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review);Coatings;2022-01-12

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