Rapid thermal annealing effect on amorphous hydrocarbon film deposited by CH4/Ar dielectric barrier discharge plasma on Si wafer: Surface morphology and chemical evaluation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3116734
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1. Simultaneous quality improvement of the roughness and refractive index of SiC thin films;Journal of Semiconductors;2012-06
2. Note: Development of fast heating inert gas annealing apparatus operated at atmospheric pressure;Review of Scientific Instruments;2012-04
3. Ultra low-k property of hydrogenated carbon nitride: Chemical evaluation;Chemical Physics Letters;2012-02
4. Current−Voltage Characteristics of in Situ Graphitization of Hydrocarbon Coated on ZnSe Nanowire;The Journal of Physical Chemistry C;2010-07-12
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