Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

Published:2017-12 Issue:12 Volume:7 Page:125310
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Kim Gwihyun¹,Park Seran²,Shin Hyunsu²,Song Seungho³,Oh Hoon-Jung⁴,Ko Dae Hong²,Choi Jung-Il³^ORCID,Baik Seung Jae¹

Affiliation:

1. Department of Electrical, Electronic, and Control Engineering, Hankyong National University, 327 Jungang-ro, Anseong-si, Gyeonggi-do, 456-749 Korea

2. Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Korea

3. Department of Computational Science and Engineering, Yonsei University, Seoul 03722, Korea

4. BIT Micro Fab Research Center, Yonsei University, Seoul 03722, Korea

Funder

Ministry of Trade, Industry and Energy

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4996797

Reference14 articles.

1. Low‐temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition

2. Crystalline Si thin-film solar cells: a review

3. Chemical vapor deposition of silicon from silane: Review of growth mechanisms and modeling/scaleup of fluidized bed reactors

4. An atomically controlled Si film formation process at low temperatures using atmospheric-pressure VHF plasma

5. Atmospheric-pressure low-temperature plasma processes for thin film deposition

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