Author:
Betiuk Marek,Mirońska Aleksandra,Oniszczuk Anna W.,Trzewiczyński Wojciech,Gajewski Wojciech,Domanowski Piotr
Reference7 articles.
1. Physics and technology of magnetron sputtering discharges
2. M. Betiuk and Z. Łataś, „Nowy system generacji plazmy na powierzchniach cylindrycznych”, WITU vol. 136(4), pp. 41–58 (2015).
3. Obtaining the CrN coating inside the barrel using a cylindrical magnetron with a dynamic magnetic field
4. Fundamentals of pulsed plasmas for materials processing
5. A. Sangalovych, S. Dudnik and V. Sangalovych, “Deposition of the stoichiometric coatings by reactive magnetron sputtering”, ФІПФИП PSE, vol. 10(3), pp. 263–272, (2012).