Plasma‐enhanced chemical vapor deposited SiO2/InP interface
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.331416
Reference35 articles.
1. Electrical properties of SiO2 and Si3N4 dielectric layers on InP
2. InP/SiO2MIS structure
3. A microwave InP/SiO2MISFET
4. InP–SiO2 m.i.s. structure with reduced interface state density near conduction band
5. Carrier generation and trapping in n‐InP/SiO2 capacitors
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