Very low pressure chemical vapor deposition process for selective titanium silicide films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99851
Reference2 articles.
1. Low pressure chemical vapor deposition of titanium silicide
2. LPCVD of Titanium Disilicide: Selectivity of Growth
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5. Further study on selective TiSi2 deposition by CVD;Microelectronic Engineering;1997-11
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