Self-organizing plasma behavior in RF magnetron sputtering discharges
Author:
Affiliation:
1. Jožef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia
Funder
Javna Agencija za Raziskovalno Dejavnost RS
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5094240
Reference55 articles.
1. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
2. Magnetron sputtering: a review of recent developments and applications
3. High power pulsed magnetron sputtering: Fundamentals and applications
4. Electrical characterization of an rf planar magnetron in inert gases
5. Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties
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