An electron‐spin resonance study of the structure of plasma‐deposited silicon‐oxynitride films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

An electron‐spin resonance study of the structure of plasma‐deposited silicon‐oxynitride films

Published:1987-08 Issue:3 Volume:62 Page:832-836
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Denisse C. M. M.,Janssen J. F. M.,Habraken F. H. P. M.,Van der Weg W. F.,Schuivens E. G. P.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.339686

Reference16 articles.

1. Plasma‐enhanced growth and composition of silicon oxynitride films

2. Gap states in silicon nitride

3. Defects in amorphous Si-N films prepared by RF sputtering

4. Annealing behavior of hydrogenated amorphous silicon—nitrogen alloy films prepared by sputtering

5. Defect states and donors in thermally annealed or post‐hydrogenated chemically vapor‐deposited amorphous SiNxalloy

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical losses of multilayer stacks synthesized with silicon oxynitride by r.f. magnetron sputtering;Thin Solid Films;1998-11

2. Synthesis and physicochemical characterization of silicon oxynitride thin films prepared by rf magnetron sputtering;Applied Optics;1997-08-01

3. ⋅Si≡Si3defect at thermally grown (111)Si/Si3N4interfaces;Physical Review B;1995-09-15

4. Silicon nitride and oxynitride films;Materials Science and Engineering: R: Reports;1994-07

5. Chemical Vapor Deposition Under Plasma Conditions;Film Deposition by Plasma Techniques;1992

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP