The role of plasma evolution and photon transport in optimizing future advanced lithography sources
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4819439
Reference21 articles.
1. V. Sizyuk, A. Hassanein, V. Morozov, and T. Sizyuk, Report No. ANL-MCS-CPH-06/56, Argonne National Laboratory, 2006.
2. Physical processes in EUV sources for microlithography
3. Conversion efficiencies from laser‐produced plasmas in the extreme ultraviolet regime
4. Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production
5. Effect of prepulse laser wavelength on EUV emission from CO2 reheated laser-produced Sn plasma
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5. On the structure of quasi-stationary laser ablation fronts in strongly radiating plasmas;Physics of Plasmas;2015-05
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